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Nanotechnology Research Center

Facilities

Characterization Facilities

X-Ray Photoelectron Spectroscopy (XPS)
xps
  • Make: ULVAC-PHI, Inc; Model: PHI5000 Version Probe III
  • High performance Micro-area analysis
  • Ultimate depth resolution
  • Both Ultra Photoelectron Spectroscopy (UPS) and X-Ray Photoelectron Spectroscopy (XPS) can be carried out
  • More than 10 samples can be analyzed at a time
  • Highly reliable automation technology
X-Ray Diffraction (Powders and thin films)
x-ray-diffraction
  • X-Pert Pro powder
  • X-Ray diffractometer
FE-SEM & EDX (Powders, Thin Films, Polished Pellets)
  • High Resolution Field Emission Electron Microscope With EDS, nanomanipulation system, Scanning TEM and E Beam lithography System
Scanning Probe Microscope (Thin films / Nanofibers)
  • Agilent Technologies – PicoSPM-LE
  • Atomic Force Microscope
  • Magnetic Force Microscope
  • Scanning Tunneling Microscope
Vibrating Sample Magnetometer (Powders and thin films)
  • Variable Temperature Vibrating Sample Magnetometer System is used to characterize the magnetic properties of materials as a function of magnetic field (0T - 3T), temperature (15K – 1000K), and time
GCMS (Other than aqueous samples)
gcms
  • GCMS – QP2010 Plus – Shimadzu - GCMS System has a 60 meter capillary column specially for the separation of VOCs.
UV-Visible Spectrophotometer (Powders, thin films)
  • UV – 3600 Plus Shimadzu
FTIR (Powders, pellet, thin films)
FTIR
  • IRTracer – 100 - Shimadzu

Growth Facilities

DC/RF Sputtering
dcrf-sputtering
  • RF power supply- Trumpf Huttinger elektronik (Model –PFG 1000 RF)
  • DC power supply – (Model –PS-1000)
  • Magnetron gun –Kurt J.Lesker (1)
  • Magnetron gun- HHV- (2)
  • IRTracer – 100 - Shimadzu
  • Varian turbo- V550
  • A high vacuum of 1 x 10-6 m.bar can be maintained within the furnace chamber.
E-Beam evaporation
e-beam-evaporation
  • Physical Vapor Deposition System with 4-Source E Beam evaporator, thermal evaporator, in-situ Argon Ion Etching and Annealing. Pumping System
  • Varian's Turbo Molecular Pump with a pumping capacity of 550l/sec
  • Advanced Thin Film Controller
  •  Evaporation Rate 0.5°A/min for perfect epitaxy
  •  Ultimate pressure attained - 1x10-7 mbar
Pulsed Laser Deposition
pulsed-laser-deposition
  • Programmable Pulsed Laser Ablation system for depositing single or multi-targeted thin films of oxide, carbide, fluoride, nitride, and inter metallic samples with the following units:
  • Deposition chamber – supplied by Kurt. J. Lesker, USA
  • Advanced Thin Film Controller
  • Vacuum system – supplied by Agilent Technologies, USA

  • Base pressure: 5 x 10-10 mbar
  • Laser source- Excimer Lasers, 248 nm from Coherent Lasers, GERMANY
Arc Melting
arc-melting
  • Argon arc melting furnace to make Alloys of high purity under an inert atmosphere or vacuum
  • Model- Thyroluxe 600
  • A DC Power supply has been provided to melt 10gms to 100gms of material having melting point up to 3500°C.
  • A high vacuum of 1 x 10 -3 m.bar can be maintained within the furnace chamber

Electrospinning unit
  • Electrospinning Unit - ESPIN - NANO
  • PECO - Chennai, India
  • 35 KV Voltage
  • 2, 5, 10 ml Syringes
  • Syringe Translation Movement
Wet chemistry
wet-chemistry
  • Electrospinning Unit - ESPIN - NANO
  • PECO - Chennai, India
  • 35 KV Voltage
  • 2, 5, 10 ml Syringes
  • Syringe Translation Movement