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Characterization Facilities
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X-Ray Photoelectron Spectroscopy (XPS) |
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Make: ULVAC-PHI, Inc; Model: PHI5000 Version Probe III
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High performance Micro-area analysis
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Ultimate depth resolution
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Both Ultra Photoelectron Spectroscopy (UPS) and X-Ray Photoelectron Spectroscopy (XPS) can be carried out
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More than 10 samples can be analyzed at a time
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Highly reliable automation technology
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X-Ray Diffraction (Powders and thin films) |
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X-Pert Pro powder
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X-Ray diffractometer
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FE-SEM & EDX (Powders, Thin Films, Polished Pellets) |
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High Resolution Field Emission Electron Microscope With EDS, nanomanipulation system, Scanning TEM and E Beam lithography System
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Scanning Probe Microscope (Thin films / Nanofibers) |
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Agilent Technologies – PicoSPM-LE
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Atomic Force Microscope
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Magnetic Force Microscope
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Scanning Tunneling Microscope
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Vibrating Sample Magnetometer (Powders and thin films) |
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Variable Temperature Vibrating Sample Magnetometer System is used to characterize the magnetic properties of materials as a function of magnetic field (0T - 3T), temperature (15K – 1000K), and time
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GCMS (Other than aqueous samples) |
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GCMS – QP2010 Plus – Shimadzu - GCMS System has a 60 meter capillary column specially for the separation of VOCs.
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UV-Visible Spectrophotometer (Powders, thin films) |
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FTIR (Powders, pellet, thin films) |
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IRTracer – 100 - Shimadzu
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Growth Facilities
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DC/RF Sputtering |
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RF power supply- Trumpf Huttinger elektronik (Model –PFG 1000 RF)
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DC power supply – (Model –PS-1000)
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Magnetron gun –Kurt J.Lesker (1)
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Magnetron gun- HHV- (2)
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IRTracer – 100 - Shimadzu
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Varian turbo- V550
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A high vacuum of 1 x 10-6 m.bar can be maintained within the furnace chamber.
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E-Beam evaporation |
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Physical Vapor Deposition System with 4-Source E Beam evaporator, thermal evaporator, in-situ Argon Ion Etching and Annealing. Pumping System
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Varian's Turbo Molecular Pump with a pumping capacity of 550l/sec
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Advanced Thin Film Controller
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Evaporation Rate 0.5°A/min for perfect epitaxy
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Ultimate pressure attained - 1x10-7 mbar
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Pulsed Laser Deposition |
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Programmable Pulsed Laser Ablation system for depositing single or multi-targeted thin films of oxide, carbide, fluoride, nitride, and inter metallic samples with the following units:
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Deposition chamber – supplied by Kurt. J. Lesker, USA
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Advanced Thin Film Controller
Vacuum system – supplied by Agilent Technologies, USA
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Base pressure: 5 x 10-10 mbar
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Laser source- Excimer Lasers, 248 nm from Coherent Lasers, GERMANY
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Arc Melting |
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Electrospinning unit |
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Electrospinning Unit - ESPIN - NANO
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PECO - Chennai, India
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35 KV Voltage
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2, 5, 10 ml Syringes
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Syringe Translation Movement
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Wet chemistry |
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Electrospinning Unit - ESPIN - NANO
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PECO - Chennai, India
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35 KV Voltage
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2, 5, 10 ml Syringes
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Syringe Translation Movement
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